Nova Patents
AT138111T

Geometries and configurations for magnetron sputtering apparatus

Abstract

This record has no abstract on file.

Term

No projected expiry on record.

  1. Priority
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44 members in 7 offices

This recordMember, by publication datePriority claim

Priority claims1

Priority claims
DocumentOfficeKindDate
43596589United States of AmericaA

Members44

Family members, oldest first
DocumentOfficeKind
US4851095AUnited States of AmericaA
EP0328257A2European Patent Office (EPO)A2
KR890013215ARepublic of KoreaA
JPH024967AJapanA
DE328257T1GermanyT1
EP0328257A3European Patent Office (EPO)A3
CA2021367A1CanadaA1
EP0409451A1European Patent Office (EPO)A1
CA2029755A1CanadaA1
EP0428358A2European Patent Office (EPO)A2
EP0428358A3European Patent Office (EPO)A3
JPH03211275AJapanA
JPH03229870AJapanA
KR920004846B1Republic of KoreaB1
US5124013AUnited States of AmericaA
US5225057AUnited States of AmericaA
EP0655515A1European Patent Office (EPO)A1
EP0428358B1European Patent Office (EPO)B1
EP0716160A1European Patent Office (EPO)A1
AT138111TThis recordAustriaT
DE69027004D1GermanyD1
DE69027004T2GermanyT2
EP0328257B1European Patent Office (EPO)B1
US5618388AUnited States of AmericaA
AT151119TAustriaT
DE68927920D1GermanyD1
DE68927920T2GermanyT2
JP2695514B2JapanB2
US5798027AUnited States of AmericaA
US5879519AUnited States of AmericaA
CA1340651CCanadaC
EP0655515B1European Patent Office (EPO)B1
AT183245TAustriaT
DE68929053D1GermanyD1
EP0716160B1European Patent Office (EPO)B1
DE68929053T2GermanyT2
AT189272TAustriaT
DE69033441D1GermanyD1
DE69033441T2GermanyT2
JP3064301B2JapanB2
CA2029755CCanadaC
EP0328257B2European Patent Office (EPO)B2
DE68927920T3GermanyT3
EP0655515B2European Patent Office (EPO)B2